Step and Flash Imprint Lithography Modeling and Process Development
نویسندگان
چکیده
منابع مشابه
Step and Flash Imprint Lithography
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve the throughput required for use in the microelectronics industry. Additionally, the rigid transparent imprint template used in SFIL enables a prec...
متن کاملDesign of Orientation Stages for Step and Flash Imprint Lithography
This paper presents the design of orientation stages for high-resolution imprint lithography machines. These machines implement a new lithography process known as Step and Flash Imprint Lithography (SFIL) and are intended for 1) sub 100 nm imprint demonstrations on flat substrates and 2) investigation of potential defect propagation during step and repeat imprinting. SFIL is an imprint lithogra...
متن کاملLayer-to-Layer Alignment for Step and Flash Imprint Lithography
The Step and Flash Imprint Lithography (SFIL) process is a low-cost, high-throughput patterning technique with a sub-100 nm resolution capability. Investigation by this group and others indicates that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template. It has also been demonstrated that the SFIL process is capab...
متن کاملTemplate fabrication schemes for step and flash imprint lithography
Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniques. The purpose of this work is to investigate alternative processes for defining features on an SFIL template. The first method considered using a ...
متن کاملStep and Flash Imprint Lithography: A Technology Review
SIAロードマップ上で予測されている微細な寸法目 標を、大変高価である従来から研究されてきた次世代 リソグラフィ(極UV、電子線投影、X線等)に頼らず に達成するため、インプリントリソグラフィ技術は研 究されている。この技術は半導体LSI以外にもマイク ロ電気機械システム(MEMS)、マイクロ光学、およ びパターン化記憶媒体などへの応用が有望視されてい る。流体排出の基本原理を利用するインプリントリソ グラフィは、像の縮小投影やそれに伴う回折ゆがみの 修正等を一切必要としない利点がある。しかしインプ リントリソグラフィ技術の中でも、より伝統的なマイ クロ鋳造法(m i c r omo l d i n g )や熱型押し法(he a t embossing)などでは、目合わせ精度やスループットに ついて克服しがたい障害が存在する。しかし現在主に テキサス大学オースティン校で開発されつつあ...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2004
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.17.417